agx: Model both sources of sample_mask
We need to control both sources to implement multisampling properly. The semantic is something like: foreach sample in the first mask { if correspond bit in second bit set { make sample live } else { make sample dead } } But I'm reticent to document more formally until the details are really understood and properly tested. Signed-off-by: Alyssa Rosenzweig <alyssa@rosenzweig.io> Part-of: <https://gitlab.freedesktop.org/mesa/mesa/-/merge_requests/23480>
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@@ -292,7 +292,7 @@ op("wait", (0x38, 0xFF, 2, _), dests = 0,
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op("get_sr", (0x72, 0x7F | L, 4, _), dests = 1, imms = [SR])
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op("sample_mask", (0x7fc1, 0xffff, 6, _), dests = 0, srcs = 1, can_eliminate = False)
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op("sample_mask", (0x7fc1, 0xffff, 6, _), dests = 0, srcs = 2, can_eliminate = False)
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# Sources: sample mask, combined depth/stencil
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op("zs_emit", (0x41, 0xFF | L, 4, _), dests = 0, srcs = 2,
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